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Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics Softcover reprint of the original 1st ed. 1993 edition
Chris R. Kleijn
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Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics Softcover reprint of the original 1st ed. 1993 edition
Chris R. Kleijn
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.
140 pages, black & white illustrations
| Mídia | Livros Paperback Book (Livro de capa flexível e brochura) |
| Lançado | 20 de novembro de 2013 |
| ISBN13 | 9783034877435 |
| Editoras | Springer Basel |
| Páginas | 139 |
| Dimensões | 152 × 229 × 7 mm · 195 g |
| Idioma | German |
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